CSET：2024极紫外光刻（EUV）技术的兴起及其对未来新兴技术的启示示研究报告（中译版）（47页）.pdf

1、Policy BriefJuly 2024Tracing the Emergence of Extreme Ultraviolet LithographyLessons for Identifying,Protecting,and Promoting theNext Emerging TechnologyAuthorJohn VerWeyCenter for Security and Emerging Technology|1 Executive Summary This paper presents a case study on the most important technology

2、to have emerged in the past decade:extreme ultraviolet(EUV)lithography.In 2019,when the first commercial electronics enabled by EUV were released,the technology was hailed as“the machine that saved Moores Law.”1 All of todays most advanced artificial intelligence(AI)chips,smartphones,autonomous driv

3、ing systems,and high-performance computers contain semiconductors fabricated using EUV lithography.The Dutch company ASML has emerged as the sole supplier of EUV machines,winning a 30-year race that granted the company a monopoly on selling the tool essential for fabricating leading-edge semiconduct

4、ors.2 However,while ASML gets well-deserved praise for developing and commercializing EUV,this papers focus is on the research community that supported EUV from the beginning:the academics in Japan,the United States,and Europe;the public-private partnerships;the conferences;and the industry collabor

5、ation that laid the groundwork for EUV in the 1980s and 1990s.Without this community,“the most technically advanced tool of any kind thats ever been made”would not have been possible.3 This paper traces the academic,government,and industry actors involved in a multi-decade moon-shot project that ult

6、imately saw EUV ascend from a speculative emerging technology to the mechanism that makes Nvidias leading-edge AI training chips and Apples latest smartphone possible.Careful study of the research community that supported EUV development is particularly relevant for policymakers and the semiconducto