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Dr. Ronny Kleinhempel-2023-09-06 CIOE talk_RevA - without video.pdf

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1、Information Classification:GeneralInformation Classification:GeneralFor Manufacturing of Optical CoatingsFHR Coating Equipment CIOE conference,ShenzhenSeptember 7th,2023Ronny KleinhempelInformation Classification:GeneralAgenda Short company presentation Introduction of FHR.Star platform High precisi

2、on coating equipment FHR.Star.EOSS FHR ALD coater concepts-CONFIDENTIAL-Information Classification:GeneralInformation Classification:GeneralCompany Presentation-CONFIDENTIAL-Information Classification:GeneralFHR product seriesFreely configurable process modules for PVD,PECVD,ALD,RIE,IBE,plasma clean

3、ingFHR.Star product seriesFHR.Boxx product seriesFHR.Line product seriesFHR.Roll product series-CONFIDENTIAL-Information Classification:GeneralCoating materials and sputtering targetsCylindrical and planar sputtering targetsSputtering targets&bonding servicesProduction and development of coating mat

4、erialsDebonding old sputtering targetsBonding new sputtering targetsConsultation on the optimal design,development and production of heat sinks and back platesRecycling valuable materials or disposing of residual materialsLarge volume or individual pieces-CONFIDENTIAL-Information Classification:Gene

5、ralFHR.Star seriesCoating Equipment for optical applications:Catalogue optics:Medical/biosciences(Fluorescence microscopy)Filters(notch,edge,)Beam-splitterLaser optics(medical,manufacturing etc)NIR bandpass filters for 3D sensing:Face recognition for user-machine interactions LIDAR as key technology

6、 for autonomous drivingDWDM/CWDM filtersTelecommunication Semiconductor wafer-level processing-CONFIDENTIAL-Information Classification:GeneralFHR.Star seriesModular Clustertype Coating EquipmentConcept Overview-CONFIDENTIAL-Information Classification:GeneralFHR.Star seriesSingle process chambersConc

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FHR公司专注于制造光学涂层设备,其产品系列包括可配置的PVD、PECVD、ALD、RIE、IBE等工艺模块。公司提供灵活的机器平台,适用于不同需求,例如,FHR.Star系列适用于光学应用,包括医疗、生物科学、滤光片、激光光学等领域。FHR的设备具有高精度涂层能力,例如,其FHR.Star.500-EOSS®设备具有全自动化生产和光学监测功能。此外,FHR还提供原子层沉积(ALD)服务,具有表面 conformal deposition和spatial ALD的特点。关键数据包括:FHR.Star.500-EOSS®的SiO2沉积速率0.45 nm/s,Ta2O5的沉积速率0.40 nm/s;FHR.Star.400x300-SALD设备可在8分钟内完成200 mm wafer上10 nm的Al2O3沉积。
如何实现高精度涂层制造?" FHR 将如何展示其先进涂层技术?" FHR.Star 系列有何独特优势?"
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